ORCID Profile
0000-0003-3924-6385
Current Organisation
Universidade do Porto Instituto de Biologia Molecular e Celular
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Publications
Ferroelectric behavior of sputter deposited Al0.72Sc0.28N approaching 5 nm thickness
Publisher: AIP Publishing
Date: 29-05-2023
DOI: 10.1063/5.0147224
Abstract: Ferroelectric Al1−xScxN has raised much interest in recent years due to its unique ferroelectric properties and complementary metal oxide semiconductor back-end-of-line compatible processing temperatures. Potential applications in embedded nonvolatile memory, however, require ferroelectric materials to switch at relatively low voltages. One approach to achieving a lower switching voltage is to significantly reduce the Al1−xScxN thickness. In this work, ferroelectric behavior in 5–27 nm films of sputter deposited Al0.72Sc0.28N has been studied. We find that the 10 kHz normalized coercive field increases from 4.4 to 7.3 MV/cm when reducing the film thickness from 27.1 to 5.4 nm, while over the same thickness range, the characteristic breakdown field of a 12.5 μm radius capacitor increases from 8.3 to 12.1 MV/cm. The 5.4 nm film demonstrates ferroelectric switching at 5.5 V when excited with a 500 ns pulse and a switching speed of 60 ns.
Missense variants in TAF1 and developmental phenotypes: Challenges of determining pathogenicity
Publisher: Hindawi Limited
Date: 25-11-2019
DOI: 10.1002/HUMU.23936
Metal-ferroelectric AlScN-semiconductor memory devices on SiC wafers
Publisher: AIP Publishing
Date: 18-09-2023
DOI: 10.1063/5.0161746
Related Organisations
Universidade Do Porto Instituto De Ciências Biomédicas Abel Salazar
Location: Portugal
Instituto Nacional De Saúde Doutor Ricardo Jorge IP
Location: Portugal
Universidade Do Porto Instituto De Biologia Molecular E Celular
Location: Portugal
Instituto Genética Médica Dr. Jacinto De Magalhães
Location: Portugal
Related Funding Activities
No related grants have been discovered for Jorge Oliveira.