Linkage Projects - Grant ID: LP0882551

Funding Activity

Website
http://dataportal.arc.gov.au/NCGP/Web/Grant/Grant/LP0882551

Funding Status
Closed

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Funded Activity Summary

Double Exposure Photoresists for the 32 and 22 nm Lithographic Nodes. The semiconductor industry is one of the largest world-wide, with annual revenue of $220B and employing over 1.5M people around the world. This project provides a unique opportunity for development within Australia of significant expertise in the field of double exposure lithography. The novel photoactive polymeric films to be developed are expected to support the next generation of microchips. A major outcome of this project will be establishment of Australia as a world-leader in this rapidly expanding field. Furthermore the technology can be applied broadly to many printing technologies.

Funded Activity Details

Start Date: 01-01-2008

End Date: 08-10-2011

Funding Scheme: Linkage Projects

Funding Amount: $750,000.00

Funder: Australian Research Council

Research Topics

ANZSRC Field of Research (FoR)

Structural Chemistry | Synthesis Of Macromolecules | Physical Chemistry (Incl. Structural) | Physical Chemistry Of Macromolecules

ANZSRC Socio-Economic Objective (SEO)

Integrated circuits and devices |

Other Keywords

Integrated circuits and devices | Physical Chemistry (Incl. Structural) | Physical Chemistry Of Macromolecules | Structural Chemistry | Synthesis Of Macromolecules

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