Linkage Infrastructure, Equipment and Facilities - Grant ID: LE150100172

Funding Activity

Website
http://dataportal.arc.gov.au/NCGP/Web/Grant/Grant/LE150100172

Funding Status
Closed

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Funded Activity Summary

Inductively-coupled plasma etching facility. Inductively-coupled plasma etching facility: The aim of this project is to bring together an inductively-coupled plasma etcher with a high resolution tool for optical lithography to create a facility capable of producing nano-structures in silicon surfaces. Such structures are the basis of high performance photonic, nano-electronic, and MicroElectroMechanical (MEM) devices. The lithography tool is a step-and-repeat system capable of exceptionally high rates of throughput so this etcher will be a crucial enabling tool for efficient fabrication of nano-devices for research into quantum computing, high bandwidth, quantum-secure optical communications, renewable energy, and for applications in medicine. The etcher will be available for national access.

Funded Activity Details

Start Date: 01-01-2015

End Date: 31-12-2016

Funding Scheme: Linkage Infrastructure, Equipment and Facilities

Funding Amount: $270,000.00

Funder: Australian Research Council

Research Topics

ANZSRC Field of Research (FoR)

Nanophotonics | Nanotechnology | Nanoelectronics | Nanofabrication, Growth and Self Assembly

ANZSRC Socio-Economic Objective (SEO)

Expanding Knowledge in the Physical Sciences | Fixed Line Data Networks and Services | Expanding Knowledge in Technology |

Other Keywords

Expanding Knowledge in Technology | Expanding Knowledge in the Physical Sciences | Fixed Line Data Networks and Services | Nanoelectronics | Nanofabrication, Growth and Self Assembly | Nanophotonics | Nanotechnology

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