Discovery Projects - Grant ID: DP0345427

Funding Activity

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Funded Activity Summary

Ion implantation induced diffusion and defect evolution in Si nanostructures. A fundamental understanding of nanostructures is essential for the development of nanoscale electronic devices. This project will investigate ion implantation of dopant atoms into Si nanostructures. The goal is to develop a broad understanding of the effect of the nanostructure dimensions on point-defect-induced diffusion and the formation of extended defects. In particular, the influence of multiple surfaces on point-defect recombination will be investigated. Concurrently, the techniques necessary for the analysis of nano-structures will be developed.

Funded Activity Details

Start Date: 01-02-2003

End Date: 07-10-2006

Funding Scheme: Discovery Projects

Funding Amount: $242,700.00

Funder: Australian Research Council