Linkage Infrastructure, Equipment And Facilities - Grant ID: LE110100121
Funder
Australian Research Council
Funding Amount
$360,000.00
Summary
Three-dimensional super-resolution nanophotonic fabrication facility. This stimulated emission depletion microscopy nanophotonic fabrication facility will be the first nanophotonic fabrication facility that is able to achieve optical resolution far beyond the diffraction limit, which will facilitate breakthroughs in cutting-edge nanotechnology research areas.
Linkage Infrastructure, Equipment And Facilities - Grant ID: LE200100003
Funder
Australian Research Council
Funding Amount
$400,000.00
Summary
3D Nanofabrication and Nanocharacterisation facility. This project aims to establish a revolutionary nanoscale fabrication and characterisation facility in Australia. The facility is an angle-based nanoscale etching system with integrated chemical analysis capabilities and will be the first instrument of its kind in Australia. The facility will enable unprecedented fabrication and characterisation of 3D nanostructures and new device geometries from semiconductors, oxides and metals that underpin ....3D Nanofabrication and Nanocharacterisation facility. This project aims to establish a revolutionary nanoscale fabrication and characterisation facility in Australia. The facility is an angle-based nanoscale etching system with integrated chemical analysis capabilities and will be the first instrument of its kind in Australia. The facility will enable unprecedented fabrication and characterisation of 3D nanostructures and new device geometries from semiconductors, oxides and metals that underpin modern nanoelectronics for innovative energy, nano-optical and quantum device applications. This unique equipment will facilitate breakthrough discoveries in nanomaterials, and foster collaborations amongst Australian researchers to accelerate industry in advanced nanodevice technologies.Read moreRead less
Linkage Infrastructure, Equipment And Facilities - Grant ID: LE110100127
Funder
Australian Research Council
Funding Amount
$250,000.00
Summary
Hall effect system for detailed electrical characterisation in semiconductors. Semiconductor characterisation is crucial for research and development in optimum growth and fabrication procedures. This Hall effect measurement system is an essential carrier characterisation technique for semiconductors with potential applications in microelectronics, optoelectronics and photovoltaics.