Linkage Infrastructure, Equipment And Facilities - Grant ID: LE160100124
Funder
Australian Research Council
Funding Amount
$300,000.00
Summary
Rapid prototyping 3-D nano-pattern large area writer . Rapid prototyping 3-D nano-pattern large area writer:
The project aims to establish a nanoscale three-dimensional patterning rapid prototyping capability to enable advanced nanofabrication research and development. The extension of patterning nanostructured materials in three dimensions with nanometre resolution, developed for semiconductor processing, to nano-electronics, nanophotonics, nanosensors, nanobiotechnology and fundamental studi ....Rapid prototyping 3-D nano-pattern large area writer . Rapid prototyping 3-D nano-pattern large area writer:
The project aims to establish a nanoscale three-dimensional patterning rapid prototyping capability to enable advanced nanofabrication research and development. The extension of patterning nanostructured materials in three dimensions with nanometre resolution, developed for semiconductor processing, to nano-electronics, nanophotonics, nanosensors, nanobiotechnology and fundamental studies of nanoscale phenomena in science and engineering has opened new opportunities in these areas. As these areas accelerate, there is a need to develop nanoscale patterns and structures via rapid prototyping pathways and with methods accessible to an ever-diverse researcher base without a background in nanofabrication. By establishing the first NanoFrazor in Australia, this project aims to provide new technology for the fabrication of high-resolution nanoscale structures and patterns.
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Linkage Infrastructure, Equipment And Facilities - Grant ID: LE150100172
Funder
Australian Research Council
Funding Amount
$270,000.00
Summary
Inductively-coupled plasma etching facility. Inductively-coupled plasma etching facility: The aim of this project is to bring together an inductively-coupled plasma etcher with a high resolution tool for optical lithography to create a facility capable of producing nano-structures in silicon surfaces. Such structures are the basis of high performance photonic, nano-electronic, and MicroElectroMechanical (MEM) devices. The lithography tool is a step-and-repeat system capable of exceptionally high ....Inductively-coupled plasma etching facility. Inductively-coupled plasma etching facility: The aim of this project is to bring together an inductively-coupled plasma etcher with a high resolution tool for optical lithography to create a facility capable of producing nano-structures in silicon surfaces. Such structures are the basis of high performance photonic, nano-electronic, and MicroElectroMechanical (MEM) devices. The lithography tool is a step-and-repeat system capable of exceptionally high rates of throughput so this etcher will be a crucial enabling tool for efficient fabrication of nano-devices for research into quantum computing, high bandwidth, quantum-secure optical communications, renewable energy, and for applications in medicine. The etcher will be available for national access.Read moreRead less