Linkage Infrastructure, Equipment And Facilities - Grant ID: LE0667994
Funder
Australian Research Council
Funding Amount
$1,000,000.00
Summary
National Nanolithography Facility. Nanotechnology is expected to have a major impact on quality of life and global economy. It is predicted to generate revenues as big as the ICT sector in 20 years time. The National Nanolithography Facility will enhance the Australian capability in the field of nanoscale science and technology. This will enable Australian researchers to achieve major impacts in many areas of nanotechnology with a strong potential impact on industry sectors such as computers, ....National Nanolithography Facility. Nanotechnology is expected to have a major impact on quality of life and global economy. It is predicted to generate revenues as big as the ICT sector in 20 years time. The National Nanolithography Facility will enhance the Australian capability in the field of nanoscale science and technology. This will enable Australian researchers to achieve major impacts in many areas of nanotechnology with a strong potential impact on industry sectors such as computers, communications, defence, health, bio-security. This facility has the potential for developing new technologies of fundamental as well as applied interest.Read moreRead less
Linkage Infrastructure, Equipment And Facilities - Grant ID: LE0238960
Funder
Australian Research Council
Funding Amount
$940,000.00
Summary
High Performance Semiconductor Micromachining Facility. The purpose of this project is to make available to the Australian semiconductor research community a facility to undertake specialist deposition and etching tasks needed for fabrication of next generation solar cells, microelectronics, optronics, and micro-electromechanical systems. The facility will have the flexibility to allow independent control of major process parameters, allowing development of new fabrication technologies which wi ....High Performance Semiconductor Micromachining Facility. The purpose of this project is to make available to the Australian semiconductor research community a facility to undertake specialist deposition and etching tasks needed for fabrication of next generation solar cells, microelectronics, optronics, and micro-electromechanical systems. The facility will have the flexibility to allow independent control of major process parameters, allowing development of new fabrication technologies which will be generic to a wide range of semiconductor materials. In particular, the facility will be unique in its ability to perform processes at low temperatures, and under conditions that allow optimisation of the deposition and etching processes, without compromising the performance of delicate devices or exceeding the maximum process temperature limitations found in many mainstream semiconductor materials technologies.Read moreRead less
Linkage Infrastructure, Equipment And Facilities - Grant ID: LE0882816
Funder
Australian Research Council
Funding Amount
$500,000.00
Summary
Micro and Nanostructure Optical Characterisation Facility. This facility will allow the carrying out of research in the area of micro and nanostructures which are of interest to Australian industry. Access to state of the art facilities will provide opportunities to train PhD students and post-doctoral fellows in the advanced science and technology fields of national and industrial interest. New technologies developed in this area have the potential to improve the quality of life, e.g. National ....Micro and Nanostructure Optical Characterisation Facility. This facility will allow the carrying out of research in the area of micro and nanostructures which are of interest to Australian industry. Access to state of the art facilities will provide opportunities to train PhD students and post-doctoral fellows in the advanced science and technology fields of national and industrial interest. New technologies developed in this area have the potential to improve the quality of life, e.g. National security, communications, health care.Read moreRead less
A novel maskless process for patterning and doping of silicon. The outcomes of this research will have consequences for the semiconductor industry by providing the potential for a completely new process tool for patterning and doping in device and circuit fabrication. The technology is also applicable as a simple and inexpensive way to 'write' conducting and insulating regions in silicon and may thus be applicable for smart cards and small industry. Successful implementation of the research will ....A novel maskless process for patterning and doping of silicon. The outcomes of this research will have consequences for the semiconductor industry by providing the potential for a completely new process tool for patterning and doping in device and circuit fabrication. The technology is also applicable as a simple and inexpensive way to 'write' conducting and insulating regions in silicon and may thus be applicable for smart cards and small industry. Successful implementation of the research will raise Australia's international profile in this area. This work will be particularly beneficial to a new high-tech Australian company, WRiota, which specializes in device technology based in nanoindentation of silicon.Read moreRead less
Amorphisation of Semiconductor and Elemental Metallic Nanocrystals by Ion Irradiation. This proposal is consistent with Research Priority 3: Frontier Technologies for Building and Transforming Australian Industries and Priority Goals: Breakthrough Science, Advanced Materials and Frontier Technologies. We seek to understand and develop a unique methodology for modifying and tailoring the structure of semiconductor and metallic nanocrystals in ways not achievable within the bulk phase. Our res ....Amorphisation of Semiconductor and Elemental Metallic Nanocrystals by Ion Irradiation. This proposal is consistent with Research Priority 3: Frontier Technologies for Building and Transforming Australian Industries and Priority Goals: Breakthrough Science, Advanced Materials and Frontier Technologies. We seek to understand and develop a unique methodology for modifying and tailoring the structure of semiconductor and metallic nanocrystals in ways not achievable within the bulk phase. Our results and accompanying scientific insight will broaden the applicability of these materials in advanced technologies, enhance the national research profile, increase the domestic knowledge base and yield skilled, young scientists trained to utilize the Australian Synchrotron when commissioned in 2007.Read moreRead less
ARC Nanotechnology Research Network. The field of nano scale science, engineering and technology (in short nanotechnology) is just emerging and it is predicted to make a major impact in all technologies and areas of society. Australian Nanotechnology Network intends to harness the combined Australian capability to enable Australia to take a leading role in this rapidly growing field.
Nanocavities in Si - Structural Evolution and Metal Gettering. Nanocavities represent a novel means of minimising metallic contamination in the active region of Si microelectronic devices. We propose innovative experiments, using in-situ transmission electron microscopy and synchrotron-based x-ray methods, to achieve a fundamental understanding of the processes that govern nanocavity structural evolution and metallic impurity trapping. We seek to develop a patentable technology to enhance impu ....Nanocavities in Si - Structural Evolution and Metal Gettering. Nanocavities represent a novel means of minimising metallic contamination in the active region of Si microelectronic devices. We propose innovative experiments, using in-situ transmission electron microscopy and synchrotron-based x-ray methods, to achieve a fundamental understanding of the processes that govern nanocavity structural evolution and metallic impurity trapping. We seek to develop a patentable technology to enhance impurity trapping efficiency and thus dramatically increase the applicability of this industrially-relevant process.Read moreRead less
Probing the properties of amorphous semiconductors with swift heavy ion irradiation and synchrotron radiation. This proposal is consistent with Research Priority 3: Frontier Technologies for Building and Transforming Australian Industries and the Priority Goals: Breakthrough Science, Frontier Technologies and Advanced Materials. We seek to deduce and understand the processes operative during swift heavy ion irradiation of amorphous semiconductors to probe fundamental materials properties. Ou ....Probing the properties of amorphous semiconductors with swift heavy ion irradiation and synchrotron radiation. This proposal is consistent with Research Priority 3: Frontier Technologies for Building and Transforming Australian Industries and the Priority Goals: Breakthrough Science, Frontier Technologies and Advanced Materials. We seek to deduce and understand the processes operative during swift heavy ion irradiation of amorphous semiconductors to probe fundamental materials properties. Our results and accompanying scientific insight will broaden the applicability of amorphous semiconductors in advanced technologies, enhance the national research profile, increase the domestic knowledge base and yield skilled, young scientists trained to utilise the Australian Synchrotron.Read moreRead less
Amorphous-Phase Formation and Structure in Semiconductor Substrates following Swift Heavy-Ion Irradiation. This proposal is consistent with Research Priority 3: Frontier Technologies for Building and Transforming Australian Industries and the Priority Goals: Breakthrough Science, Frontier Technologies and Advanced Materials. We seek to deduce and understand the processes operative during swift heavy-ion irradiation of elemental and binary semiconductor substrates and identify and measure the ....Amorphous-Phase Formation and Structure in Semiconductor Substrates following Swift Heavy-Ion Irradiation. This proposal is consistent with Research Priority 3: Frontier Technologies for Building and Transforming Australian Industries and the Priority Goals: Breakthrough Science, Frontier Technologies and Advanced Materials. We seek to deduce and understand the processes operative during swift heavy-ion irradiation of elemental and binary semiconductor substrates and identify and measure the resulting amorphous-phase structure. Our results and accompanying scientific insight will broaden the applicability of these materials in advanced technologies, enhance the national research profile, increase the domestic knowledge base and yield skilled, young scientists trained to utilize the Australian Synchrotron when commissioned in 2007.Read moreRead less
Atomic-Scale Identification of Amorphization and Relaxation Processes in Compound Semiconductors. We seek a fundamental understanding of the processes that govern implantation-induced structure, at the nanometer scale, in the compound semiconductors used in photonic device fabrication. Since implantation-induced disorder limits the performance of such devices, the proposed project is of substantial technological significance and national benefit. The Photon Science techniques of perturbed angu ....Atomic-Scale Identification of Amorphization and Relaxation Processes in Compound Semiconductors. We seek a fundamental understanding of the processes that govern implantation-induced structure, at the nanometer scale, in the compound semiconductors used in photonic device fabrication. Since implantation-induced disorder limits the performance of such devices, the proposed project is of substantial technological significance and national benefit. The Photon Science techniques of perturbed angular correlation and extended x-ray absorption fine structure spectroscopy will be used to identify the mechanism of amorphisation and relaxation in order to enable more effective exploitation of compound semiconductors in advanced telecommunications systems.Read moreRead less