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Swift heavy ion induced nano-porous antimony-based semiconductors. This project aims to study the fabrication and application of nano-porous antimony based semiconductors prepared by high-energy ion irradiation. Using a unique combination of synchrotron and laboratory- based analytical techniques as well as computer simulations, the project expects to identify the physical mechanisms for porous structure formation and exploit the materials for application in thermoelectric and thermo-photovoltai ....Swift heavy ion induced nano-porous antimony-based semiconductors. This project aims to study the fabrication and application of nano-porous antimony based semiconductors prepared by high-energy ion irradiation. Using a unique combination of synchrotron and laboratory- based analytical techniques as well as computer simulations, the project expects to identify the physical mechanisms for porous structure formation and exploit the materials for application in thermoelectric and thermo-photovoltaic devices. Expected outcomes of the project include fabrication processes compatible with current device fabrication methodologies that should enable rapid integration of the materials into advanced device applications. Significant benefits should result from novel applications of the technologies such as energy harvesting and sensor devices.Read moreRead less
Epitaxial growth of III-V microring lasers for integrated silicon photonics. This project aims to investigate the growth and demonstration of compound semiconductor microring lasers on silicon substrates, using selective area growth to engineer the shape of the lasing cavity at the nano/micro-scale. Silicon photonics is currently a dominant technology in optical and data communication systems, and the continued development demands higher speeds, lower power consumption and lower costs. However, ....Epitaxial growth of III-V microring lasers for integrated silicon photonics. This project aims to investigate the growth and demonstration of compound semiconductor microring lasers on silicon substrates, using selective area growth to engineer the shape of the lasing cavity at the nano/micro-scale. Silicon photonics is currently a dominant technology in optical and data communication systems, and the continued development demands higher speeds, lower power consumption and lower costs. However, on-chip integrated, high efficiency lasers are still elusive due to mismatch in material platforms between the lasers and silicon substrates. This project will produce reliable, efficient and easily manufacturable laser sources integrated on silicon photonic chips. It is also expected to pave the way for more development of this technology by the industry to further drive the cost of silicon photonics technology down whilst increasing data transmission speed.Read moreRead less