Linkage Infrastructure, Equipment And Facilities - Grant ID: LE0238960
Funder
Australian Research Council
Funding Amount
$940,000.00
Summary
High Performance Semiconductor Micromachining Facility. The purpose of this project is to make available to the Australian semiconductor research community a facility to undertake specialist deposition and etching tasks needed for fabrication of next generation solar cells, microelectronics, optronics, and micro-electromechanical systems. The facility will have the flexibility to allow independent control of major process parameters, allowing development of new fabrication technologies which wi ....High Performance Semiconductor Micromachining Facility. The purpose of this project is to make available to the Australian semiconductor research community a facility to undertake specialist deposition and etching tasks needed for fabrication of next generation solar cells, microelectronics, optronics, and micro-electromechanical systems. The facility will have the flexibility to allow independent control of major process parameters, allowing development of new fabrication technologies which will be generic to a wide range of semiconductor materials. In particular, the facility will be unique in its ability to perform processes at low temperatures, and under conditions that allow optimisation of the deposition and etching processes, without compromising the performance of delicate devices or exceeding the maximum process temperature limitations found in many mainstream semiconductor materials technologies.Read moreRead less
Linkage Infrastructure, Equipment And Facilities - Grant ID: LE0561240
Funder
Australian Research Council
Funding Amount
$121,510.00
Summary
Combined reactor for the plasma-enhanced chemical vapour deposition (PECVD) of amorphous layers of silicon, silicon nitride and silicon oxide, and for Reactive Ion Etching. Our small, but very productive group (up to 30 publications per Discovery grant) has reached critical mass (8 people), and the acquisition of essential infrastructure is peremptory. Without the proposed plasma reactor our strong international impact (10 papers, one invited, at the 2003 world conference on photovoltaics) will ....Combined reactor for the plasma-enhanced chemical vapour deposition (PECVD) of amorphous layers of silicon, silicon nitride and silicon oxide, and for Reactive Ion Etching. Our small, but very productive group (up to 30 publications per Discovery grant) has reached critical mass (8 people), and the acquisition of essential infrastructure is peremptory. Without the proposed plasma reactor our strong international impact (10 papers, one invited, at the 2003 world conference on photovoltaics) will wane. This machine permits to deposit thin layers of silicon nitride and amorphous silicon and is a versatile tool for investigating silicon materials for photovoltaics and microelectronics. Such reactors have become an essential tool for silicon solar cell work. Most laboratories across the world have at least one, including UNSW, but access to the latter is impractical.Read moreRead less