ARC Centre of Excellence for Ultrahigh Bandwidth Devices for Optical Systems. The Centre will take the next big step in optical systems by transforming photonic integrated circuits into a technology that will have a profound effect on economies and lifestyles around the world. This will enable the Internet to transfer vast amounts of data with significantly improved energy efficiency; it will lead to secure transmission using quantum photonics-based devices, and to the detection of mid-infrared ....ARC Centre of Excellence for Ultrahigh Bandwidth Devices for Optical Systems. The Centre will take the next big step in optical systems by transforming photonic integrated circuits into a technology that will have a profound effect on economies and lifestyles around the world. This will enable the Internet to transfer vast amounts of data with significantly improved energy efficiency; it will lead to secure transmission using quantum photonics-based devices, and to the detection of mid-infrared signatures of light from distant stars and complex molecules of environmental or biochemical importance. We will achieve this by developing new materials with optical properties to control light and engineering them into miniature photonic processors.Read moreRead less
Linkage Infrastructure, Equipment And Facilities - Grant ID: LE150100172
Funder
Australian Research Council
Funding Amount
$270,000.00
Summary
Inductively-coupled plasma etching facility. Inductively-coupled plasma etching facility: The aim of this project is to bring together an inductively-coupled plasma etcher with a high resolution tool for optical lithography to create a facility capable of producing nano-structures in silicon surfaces. Such structures are the basis of high performance photonic, nano-electronic, and MicroElectroMechanical (MEM) devices. The lithography tool is a step-and-repeat system capable of exceptionally high ....Inductively-coupled plasma etching facility. Inductively-coupled plasma etching facility: The aim of this project is to bring together an inductively-coupled plasma etcher with a high resolution tool for optical lithography to create a facility capable of producing nano-structures in silicon surfaces. Such structures are the basis of high performance photonic, nano-electronic, and MicroElectroMechanical (MEM) devices. The lithography tool is a step-and-repeat system capable of exceptionally high rates of throughput so this etcher will be a crucial enabling tool for efficient fabrication of nano-devices for research into quantum computing, high bandwidth, quantum-secure optical communications, renewable energy, and for applications in medicine. The etcher will be available for national access.Read moreRead less