Linkage Infrastructure, Equipment And Facilities - Grant ID: LE210100156
Funder
Australian Research Council
Funding Amount
$289,500.00
Summary
3D Two-Photon Nanoprinter for Advanced Multi-Functional Materials & Devices. The Nanoscribe Photonic Professional GT2 Two-Photon 3D Printer enables tailoring materials’ architecture at nanoscale. This results in unique optical, mechanical, electrical, chemical, biochemical, and acoustic properties enabling a wealth of cutting-edge research activities in variety of fields including mechanical/optical/electrical metamaterials, bioinspired hard/soft materials, biomaterials (e.g., structured cell-ti ....3D Two-Photon Nanoprinter for Advanced Multi-Functional Materials & Devices. The Nanoscribe Photonic Professional GT2 Two-Photon 3D Printer enables tailoring materials’ architecture at nanoscale. This results in unique optical, mechanical, electrical, chemical, biochemical, and acoustic properties enabling a wealth of cutting-edge research activities in variety of fields including mechanical/optical/electrical metamaterials, bioinspired hard/soft materials, biomaterials (e.g., structured cell-tissue interfaces), biomedical devices (implantable devices and drug-delivery systems), nanofluidics, and photonic crystals. In each of these fields, we will use GT2 to print variety of polymers, hydrogels, metals and ceramics, for example by printing polymer-derived nanoceramics that will be simultaneously strong and tough.Read moreRead less
Discovery Early Career Researcher Award - Grant ID: DE140100805
Funder
Australian Research Council
Funding Amount
$395,220.00
Summary
Radioisotope-powered Parallel Electron Lithography for High-throughput Nano-manufacturing. This project aims to realise rapid fabrication of controllable nano-devices over large areas with high throughput and low cost. The lack of large-size (greater than four inch) mask and ultra-low dose resist are the fundamental challenges for high-throughput radioisotope-powered parallel electron nano-lithography (RIPEL) systems. This project aims to realise a large-size RIPEL mask by using the ultra-light ....Radioisotope-powered Parallel Electron Lithography for High-throughput Nano-manufacturing. This project aims to realise rapid fabrication of controllable nano-devices over large areas with high throughput and low cost. The lack of large-size (greater than four inch) mask and ultra-low dose resist are the fundamental challenges for high-throughput radioisotope-powered parallel electron nano-lithography (RIPEL) systems. This project aims to realise a large-size RIPEL mask by using the ultra-light supporting material aerographite that has a state-of-the-art ratio value of Young's modulus to cubic density. It will also develop a new inorganic nanoparticle resist with ultra-low dose. These building blocks will enhance RIPEL's throughput by four orders of magnitude. The project will contribute to making processors or solid state storage cheaper and more efficient.Read moreRead less