Linkage Infrastructure, Equipment And Facilities - Grant ID: LE0238960
Funder
Australian Research Council
Funding Amount
$940,000.00
Summary
High Performance Semiconductor Micromachining Facility. The purpose of this project is to make available to the Australian semiconductor research community a facility to undertake specialist deposition and etching tasks needed for fabrication of next generation solar cells, microelectronics, optronics, and micro-electromechanical systems. The facility will have the flexibility to allow independent control of major process parameters, allowing development of new fabrication technologies which wi ....High Performance Semiconductor Micromachining Facility. The purpose of this project is to make available to the Australian semiconductor research community a facility to undertake specialist deposition and etching tasks needed for fabrication of next generation solar cells, microelectronics, optronics, and micro-electromechanical systems. The facility will have the flexibility to allow independent control of major process parameters, allowing development of new fabrication technologies which will be generic to a wide range of semiconductor materials. In particular, the facility will be unique in its ability to perform processes at low temperatures, and under conditions that allow optimisation of the deposition and etching processes, without compromising the performance of delicate devices or exceeding the maximum process temperature limitations found in many mainstream semiconductor materials technologies.Read moreRead less
Linkage Infrastructure, Equipment And Facilities - Grant ID: LE0775499
Funder
Australian Research Council
Funding Amount
$130,000.00
Summary
High Performance Optical Profilometer for mapping micro/meso/macroscopic topography. Developing advanced, high performance new materials requires an understanding of surfaces and interfaces. Making a small area, low yield material or device is a regular occurrence within the Australian research community. The ability to create reproducible, high yield materials requires greater understanding of the stresses, uniformities and deformations in a material over large areas. The proposed instrument ....High Performance Optical Profilometer for mapping micro/meso/macroscopic topography. Developing advanced, high performance new materials requires an understanding of surfaces and interfaces. Making a small area, low yield material or device is a regular occurrence within the Australian research community. The ability to create reproducible, high yield materials requires greater understanding of the stresses, uniformities and deformations in a material over large areas. The proposed instrument can measure topography over many centimeters-squared with sub-micron spatial resolution, currently beyond the capabilities of researchers in Australia. By providing a quantitative method to measure surface textures, the instrument will also support Australian industries looking for improved process control.Read moreRead less
Miniaturised Adiabatic Light Processing Devices. The project will develop, model and analyse a range of miniaturised light-processing devices for optical communications applications that rely soley on their geometrical design for their optical functionality. Such devices are less complex than devices that rely on other physical phenomena for their operation, such as interference, resonance or grating phenomena. They have potential application to a wide range of applications including optical tel ....Miniaturised Adiabatic Light Processing Devices. The project will develop, model and analyse a range of miniaturised light-processing devices for optical communications applications that rely soley on their geometrical design for their optical functionality. Such devices are less complex than devices that rely on other physical phenomena for their operation, such as interference, resonance or grating phenomena. They have potential application to a wide range of applications including optical telecommunications, optical sensing and biophotonics. The major outcome will be a range of novel devices that are very compact, have very low optical power loss and process light signals in ways that either cannot be readily achieved by other approaches or are simpler than other approaches.Read moreRead less
Monolithic Integration of Silicon Waveguide and Ge1-xSix Photodetector on Silicon-on Insulator Platform for Intra-chip Optical Interconnect. Photonics has become the major technology underpinning the communication and storage of data. As photonics advances applications are emerging which demand components be manufactured cheaply in the manner achieved by the electronics industry in the silicon chip. Silicon is now emerging as an important photonic material and devices can benefit from inexpensiv ....Monolithic Integration of Silicon Waveguide and Ge1-xSix Photodetector on Silicon-on Insulator Platform for Intra-chip Optical Interconnect. Photonics has become the major technology underpinning the communication and storage of data. As photonics advances applications are emerging which demand components be manufactured cheaply in the manner achieved by the electronics industry in the silicon chip. Silicon is now emerging as an important photonic material and devices can benefit from inexpensive processing methods developed for electronics. This project aims to capture key intellectual property for monolithically integrating key photonic components onto a silicon platform. The project can bring social and commercial benefits to Australia such as high-level research and training in nanotechnology as well as opportunities for commercialisation in niche markets.Read moreRead less
Development of inert gas ion beams for fabrication of nano-structures. This project will develop a high brightness, high density ion beam for reactive fabrication of structures with dimensions of the order of and less than 100 nano-metres. Present systems use liquid metal ion sources which can pollute the substrates being fabricated. Use of inert gas ions will overcome this problem and lead to a new type of ion source to replace the older systems. Added advantages include significantly increased ....Development of inert gas ion beams for fabrication of nano-structures. This project will develop a high brightness, high density ion beam for reactive fabrication of structures with dimensions of the order of and less than 100 nano-metres. Present systems use liquid metal ion sources which can pollute the substrates being fabricated. Use of inert gas ions will overcome this problem and lead to a new type of ion source to replace the older systems. Added advantages include significantly increased lifetime much higher reproducibility. Our commercial collaborator, FEI Company, estimate the world market as being $US100,000,000 and will actively promote this technology worldwide when it is fully developed.Read moreRead less
Implant Isolation of III-V Compound Semiconductor Devices and Structures. Individual devices in an integrated circuit can be electrically isolated from each other by irradiating the materials between them with high energy ions. This creates defects in the semiconductor that trap charge carriers and thereby increase the resistance of the material. However, the effectiveness of this process depends on the material as well as irradiation and post-irradiation processing conditions. This project aim ....Implant Isolation of III-V Compound Semiconductor Devices and Structures. Individual devices in an integrated circuit can be electrically isolated from each other by irradiating the materials between them with high energy ions. This creates defects in the semiconductor that trap charge carriers and thereby increase the resistance of the material. However, the effectiveness of this process depends on the material as well as irradiation and post-irradiation processing conditions. This project aims to develop an implant isolation scheme for a new class of devices developed by Epitactix, an Australian start-up company founded on CSIRO research. This will be achieved by combining the ANU's experience and expertise in ion-irradiation and defect engineering with the device and processing expertise of Epitactix Pty Ltd.Read moreRead less
A novel maskless process for patterning and doping of silicon. The outcomes of this research will have consequences for the semiconductor industry by providing the potential for a completely new process tool for patterning and doping in device and circuit fabrication. The technology is also applicable as a simple and inexpensive way to 'write' conducting and insulating regions in silicon and may thus be applicable for smart cards and small industry. Successful implementation of the research will ....A novel maskless process for patterning and doping of silicon. The outcomes of this research will have consequences for the semiconductor industry by providing the potential for a completely new process tool for patterning and doping in device and circuit fabrication. The technology is also applicable as a simple and inexpensive way to 'write' conducting and insulating regions in silicon and may thus be applicable for smart cards and small industry. Successful implementation of the research will raise Australia's international profile in this area. This work will be particularly beneficial to a new high-tech Australian company, WRiota, which specializes in device technology based in nanoindentation of silicon.Read moreRead less